All of the performance. None of the limitations.
Features:
- True differential pressure measurement
- Lower inlet pressure operation capability
- Downstream valve architecture
- Matched transient response
- Zero Leak-by Control Valve
- MultiFloTM technology allows for flexible programming of gas and flow range configurations without removing the MFC from the gas line or compromising accuracy
- Local display indicates flow, temperature, pressure, and network address
- DeviceNetTM, EtherCAT?, RS-485 L-Protocol, and analog interfaces
Benefits:
- GP200 differential pressure technology reduces measurement uncertainty, enhancing accuracy, repeatability, and drift performance by eliminating the need to match and compensate two separate pressure transducers.
- Safer operation at lower inlet pressures possible with a P-MFC using the optimized GP200 differential pressure sensor for low differential pressure measurement.
- Accuracy remains independent of downstream pressure due to the downstream valve architecture, enabling flow delivery into pressures as high as 1200 Torr. The fast closing valve addresses non-productive recipe wait times and mitigates “tail effects” seen in upstream MFC valve designs that require additional time to bleed down their internal gas volume.
- Ultra-fast and highly repeatable ascending and descending flow stabilization time allows for tighter process control in advanced high-cycle Deposition and Etch processes.
- 100X improvement in valve shut-down capability.
- MultiFloTM enables re-scaling of MFC full-scale flow range down by a factor of 3:1 without impacting accuracy, turndown, or leak-by specifications, providing process and inventory flexibility.
- Convenient user display and independent diagnostic/service port facilitate device installation, monitoring, and troubleshooting.
Key Applications:
- Semiconductor manufacturing
- Etch processes
- Chemical Vapor Deposition (CVD)
- Gas flow control applications that require a high-purity all-metal flow path
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